EUV-LET 2.0: a compact exposure tool for industrial research at a wavelength of 13.5nm

Bellingham, Washington, USA / SPIE (2019) [Contribution to a book, Contribution to a conference proceedings]

Extreme Ultraviolet (EUV) Lithography X : 25-28 February 2019, San Jose, California, Unites States / Kenneth A. Goldberg (editor) ; sponsored by: SPIE

Authors

Selected Authors

Brose, Sascha Manuel
Danylyuk, Serhiy
Bahrenberg, Lukas
Lebert, Rainer
Stollenwerk, Jochen Hugo

Other Authors

Loosen, Peter
Juschkin, Larissa

Identifier