Preliminary results from key experiments on sources for EUV lithography

Lebert, R.; Aschke, L.; Bergmann, K.; Dusterer, S.; Gäbel, K.; Hoffmann, D.; Loosen, Peter; Neff, Willi; Nickles, P.; Rosier, O.; Poprawe, Reinhart; Rudolph, D.; Sandner, W.; Sauerbrey, R.; Schmahl, G.; Schwoerer, H.; Stiehl, H.; Will, I.; Ziener, C.

Amsterdam [u.a.] : Elsevier (2001)
Journal Article

In: Microelectronic engineering
Volume: 57/58
Page(s)/Article-Nr.: 87-92

Identifier