High effenciency transmission masks for XUV nanostructuring and interference lithography

Brose, Sascha; Danylyuk, Serhiy; Juschkin, Larissa; Loosen, Peter; Moers, J.; Trellenkamp, St.; Panaitov, G.; Wambach, K.; Grützmacher, D.

Jülich [u.a.] : Forschungszentrum Jülich ; RWTH Aachen University (2010)
Contribution to a book

In: JARA FIT Jülich Aachen Research Alliance for Fundamentals of Future Information Technologies : Annual Report 2009 / Eds.: Wolfgang Albrecht, Markus Morgenstern, Detlev Grützmacher
Page(s)/Article-Nr.: 43-44

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