Repetitive plasma focus as radiation source for X-ray lithography

New York, NY / American Inst. of Physics (1989) [Contribution to a book, Contribution to a conference proceedings]

AIP conference proceedings. - 195
Page(s): 515-521

Authors

Authors

Richter, F.
Eberle, J.
Holz, R.
Neff, W.
Lebert, R.

Identifier

  • REPORT NUMBER: RWTH-CONV-191445