Actinic EUV-Mask metrology: tools, concepts, components

Bellingham, Wa / SPIE (2011) [Contribution to a book, Contribution to a conference proceedings]

27th European Mask and Lithography Conference : 18 - 19 January 2011, Dresden, Germany / organized by VDE/VDI GMM - the Society for Microelectronics, Micro- and Precision Engineering (Germany). Uwe F. W. Behringer, ed.
Page(s): 79850-B, 6 S.

Authors

Selected Authors

Lebert, Rainer
Farahzadi, Azadeh
Diete, Wolfgang
Schäfer, David
Phiesel, Wolfgang

Other Authors

Wilhein, Thomas
Herbert, Stefan
Maryasov, Aleksey
Juschkin, Larissa
Esser, Dominik
Hoefer, Marko
Hoffmann, Dieter

Identifier