Actinic EUV-Mask metrology: tools, concepts, components
Bellingham, Wa / SPIE (2011) [Contribution to a book, Contribution to a conference proceedings]
27th European Mask and Lithography Conference : 18 - 19 January 2011, Dresden, Germany / organized by VDE/VDI GMM - the Society for Microelectronics, Micro- and Precision Engineering (Germany). Uwe F. W. Behringer, ed.
Page(s): 79850-B, 6 S.