Power scaling of an extreme ultraviolet light source for future lithography

Melville, NY / AIP (2008) [Journal Article]

Applied physics letters
Volume: 92
Issue: 18
Page(s): 181501

Authors

Selected Authors

Wagenaars, Erik
Küpper, Felix Alexander
Klein, Jürgen
Neff, Willi
Damen, Marcel

Other Authors

van de Wel, Pieter
Vaudrevange, Dominik
Jonkers, Jeroen

Identifier