Preliminary results from key experiments on sources for EUV lithography

Amsterdam [u.a.] / Elsevier (2001) [Journal Article]

Microelectronic engineering
Volume: 57/58
Page(s): 87-92

Authors

Selected Authors

Lebert, R.
Aschke, L.
Bergmann, K.
Dusterer, S.
Gäbel, K.

Other Authors

Hoffmann, D.
Loosen, Peter
Neff, Willi
Nickles, P.
Rosier, O.
Poprawe, Reinhart
Rudolph, D.
Sandner, W.
Sauerbrey, R.
Schmahl, G.
Schwoerer, H.
Stiehl, H.
Will, I.
Ziener, C.

Identifier