A multi-kilohertz pinch plasma radiation source for extreme ultraviolet lithography

Amsterdam [u.a.] / Elsevier (2001) [Journal Article]

Microelectronic engineering
Volume: 57/58
Page(s): 71-77

Authors

Authors

Bergmann, Klaus
Rosier, Oliver
Lebert, Rainer
Neff, Willi
Poprawe, Reinhart

Identifier