Pinch-plasma radiation source for extreme-ultraviolet lithography with a kilohertz repetition frequency

Washington, DC / Optical Society of America (2000) [Journal Article]

Applied optics
Volume: 39
Issue: 22
Page(s): 3833-3837

Authors

Authors

Bergmann, Klaus
Rosier, Oliver
Neff, Willi
Lebert, Rainer

Identifier