Scalability limits of Talbot lithography with plasma-based extreme ultraviolet sources

Bellingham, Wash / SPIE (2013) [Journal Article]

Journal of micro/nanolithography, MEMS and MOEMS
Volume: 12
Issue: 3
Page(s): 033002

Authors

Authors

Danylyuk, Serhiy
Loosen, Peter
Bergmann, Klaus
Kim, Hyun-su
Juschkin, Larissa

Identifier