High effenciency transmission masks for XUV nanostructuring and interference lithography

Jülich [u.a.] / Forschungszentrum Jülich ; RWTH Aachen University (2010) [Contribution to a book]

JARA FIT Jülich Aachen Research Alliance for Fundamentals of Future Information Technologies : Annual Report 2009 / Eds.: Wolfgang Albrecht, Markus Morgenstern, Detlev Grützmacher
Page(s): 43-44

Authors

Selected Authors

Brose, Sascha
Danylyuk, Serhiy
Juschkin, Larissa
Loosen, Peter
Moers, J.

Other Authors

Trellenkamp, St.
Panaitov, G.
Wambach, K.
Grützmacher, D.

Identifier

  • REPORT NUMBER: RWTH-CONV-105570